TS0718N30-60

Teslaman TS0718N30- 60 is a high- performance integrated power supply system specifically designed for Ion Beam Etching (IBE) equipment, developed based on the Kaufman ion source principle. The system integrates eight independent high- voltage power supply modules: Fila (filament), Arc (arc discharge), Ele- Ext (extraction electrode), Ion-Rep (ion reflector), Bias (substrate bias), Ele-Rep (electron reflector), and Pul1/Pul2 (puller), comprehensively covering the three major functional stages of plasma generation, ion extraction and acceleration, and precise process control. The system features ultra-low ripple at the mV level and ultra- high stability of 0.01%, with a modular architecture that supports simultaneous multi- channel high- voltage output and fast dynamic response. Customization is available upon request.

Typical Application：Ion Beam Etching (IBE), Reactive Ion Beam Etching (RIBE), Focused Ion Beam (FIB), semiconductor failure analysis, and micro/nano optics.

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