Electron Beam Divergence Control in High Voltage Power Supply of Electron Beam System

In many modern fields such as material processing, electronics manufacturing, and scientific research, electron beam systems play a crucial role due to their characteristics of high energy density, precise controllability, etc. In an electron beam system, the effective control of electron beam divergence by the high voltage power supply is directly related to the system performance and application effects.
The high voltage power supply of the electron beam system is responsible for providing the high voltage required for electron emission. In principle, after electrons are emitted from the cathode, they are accelerated by the high voltage electric field to obtain high speeds and form a directed electron beam. However, during the transmission of the electron beam, due to the influence of various factors, the electron beam will diverge. This will reduce the energy concentration of the electron beam and affect its processing accuracy or the accuracy of experimental results.
One of the important influencing factors is the space charge effect. When a large number of electrons move at high speeds in a narrow space, the mutual repulsive force between electrons will cause the electron beam to expand outward, that is, divergence occurs. The output stability of the high voltage power supply is crucial in this process. A stable high voltage output can ensure that the electric field force received by the electron beam during acceleration is constant, reducing the difference in electron speeds caused by voltage fluctuations, thereby reducing the degree of divergence caused by the space charge effect. If the high voltage power supply has voltage fluctuations, the electrons in the electron beam are accelerated unevenly, the speed distribution widens, the space charge effect intensifies, and the divergence of the electron beam will deteriorate significantly.
In addition, electromagnetic interference in the electron beam system also has an impact on electron beam divergence. Stray electromagnetic fields in the surrounding environment or electromagnetic fields generated by other components within the system may interact with the electron beam, interfering with the movement trajectory of electrons and causing the electron beam to diverge. As a high voltage component in the system, if the electromagnetic field generated by the high voltage power supply cannot be effectively shielded and suppressed, it will also become one of the sources of electromagnetic interference.
In order to achieve precise control of electron beam divergence, first, the design of the high voltage power supply should be optimized. Advanced voltage stabilizing technologies are adopted to improve the stability of the power supply output and control voltage fluctuations within a very small range to reduce the adverse effects of the space charge effect. At the same time, good electromagnetic shielding designs should be carried out for the high voltage power supply and its connection lines to reduce external electromagnetic radiation and prevent external electromagnetic interference from entering the system.
In practical applications, it is also necessary to dynamically adjust the parameters of the high voltage power supply according to different working conditions. For example, when processing different materials or performing different technological operations with an electron beam, by adjusting the output voltage and current of the high voltage power supply, the energy and beam current density of the electron beam can be changed, so as to compensate to a certain extent for the changes in electron beam divergence caused by changes in material properties or technological requirements.
In conclusion, the electron beam divergence control of the high voltage power supply in the electron beam system is a complex and crucial issue, involving many aspects such as power supply performance, electromagnetic environment, and application requirements. Only by comprehensively considering these factors and taking effective control measures can high precision and low divergence transmission of the electron beam be achieved, giving full play to the advantages of the electron beam system in various fields.