The Influence of Pulse Width of Coating Pulse High Voltage Power Supply

In the field of modern material surface treatment and coating technology, the coating pulse high voltage power supply, as a key device, plays a decisive role in coating quality. Among them, the pulse width, as one of the important parameters of the pulse high voltage power supply, has a significant impact on the coating process in many aspects.
From the basic principle, the coating pulse high voltage power supply provides the necessary energy for the coating process by outputting periodic high voltage pulses. The pulse width determines the duration of each pulse, which directly affects the energy obtained by the ions or particles involved in the coating and their deposition behavior on the substrate surface.
When the pulse width is small, ions gain energy and impact the substrate in a very short time. In this case, the ion energy is relatively concentrated, but the action time is short. In some applications that require precise control of the film growth thickness and structure, a narrow pulse width helps to achieve atomic level layer by layer deposition. For example, when preparing high precision optical films, narrow pulses can control the thickness uniformity of each film layer within a very small range, ensuring the stable optical properties of the film and reducing light scattering and absorption losses. However, an overly narrow pulse width may result in a low deposition rate, prolonging the coating time and increasing production costs.
Conversely, if the pulse width is large, the time for ions to gain energy is extended, and the energy they carry also increases accordingly. This makes the ions have a stronger penetration ability when they impact the substrate, being able to form a deeper diffusion layer on the substrate surface. In some application scenarios that require enhancing the adhesion between the film and the substrate, such as plating wear resistant coatings on metal workpieces, a larger pulse width can promote better integration of ions with substrate atoms, improving the adhesion between the film and the substrate and effectively enhancing the durability of the film. But a larger pulse width may also cause excessive sputtering effects, which not only damage the deposited film structure but also increase the surface roughness of the film, affecting the flatness and gloss of the film.
In the actual coating process, it is necessary to accurately adjust the pulse width according to different coating materials, substrate materials, and expected film properties. For example, for soft textured substrate materials, in order to avoid substrate damage caused by high ion energy, the pulse width should be appropriately reduced; while for hard textured substrates that require enhanced film adhesion, the pulse width can be appropriately increased. At the same time, coordinated optimization with other process parameters such as pulse frequency and power supply voltage is required to obtain the desired coating effect.
In summary, the pulse width of the coating pulse high voltage power supply plays a crucial role in the coating process. It has a significant impact on the deposition rate, thickness uniformity, adhesion, surface roughness, and internal structure of the film. In depth understanding and precise control of the pulse width are one of the core points to improve coating quality and meet diverse industrial needs.