Ion source

High stability and ultra-low ripple fast arc response anti-interference and high reliability

The ion source is the “heart” of charged particle equipment, responsible for ionizing gas or solid materials, generating and screening out the desired ions and forming the initial beam. As the starting point of accelerators, analytical instruments, and ion implantation systems, its performance directly determines the quality of downstream applications. It is widely in the manufacture of semiconductor chips, material surface modification, medical isotope production, cancer particle therapy, and cutting-edge nuclear physics research.
This core process heavily relies on the-voltage power supply that powers it. The stability and low ripple of the power supply determine the energy purity of the beam, its arc resistance ensures the long-term reliable operation the ion source, and precise digital control is key to achieving stable reproducibility and process control. Matching the ion source with a high-performance power supply is the foundation ensuring the overall system's excellent performance from the source.