Focused Ion Beam High-Voltage Power Supply: Optimization of Ion Beam Lens Performance

Focused ion beam (FIB) systems are extensively used for micro- and nanoscale material modification, semiconductor failure analysis, and high-resolution imaging. The precision of imaging and machining largely depends on ion beam focusing, which is determined by the stability and accuracy of the high-voltage power supply driving the ion source and electrostatic lenses.
Optimization focuses on electric field uniformity and voltage response precision. Multi-channel high-voltage configurations independently control the acceleration electrode, electrostatic lens, and deflection elements, achieving potential differences accurate to 0.01%. Digital synchronous control allows real-time adjustment of lens voltages to maintain ion trajectories within nanometer-scale tolerances.
Thermal effects and voltage ripple can degrade beam focus. High-precision temperature compensation circuits and low-noise filtering reduce ripple to below 5 ppm. Adaptive feedback algorithms adjust lens voltages based on beam intensity and imaging results, maintaining optimal focus even during dynamic scanning.
High-speed operation is essential for rapid beam scanning and nanoscale patterning. High-frequency PWM control combined with optical isolation ensures sub-100 µs voltage response times, preserving beam stability. This optimized high-voltage supply significantly enhances FIB resolution and machining precision for semiconductor and nanostructure applications.